We present a first-principles approach for computing the phonon-limited T-1 spin relaxation time due to the Elliott-Yafet mechanism. Our scheme combines fully relativistic spin-flip electron-phonon interactions with an approach to compute the effective spin of band electrons in materials with inversion symmetry. We apply our method to silicon and diamond, for which we compute the temperature dependence of the spin relaxation times and analyze the contributions to spin relaxation from different phonons and valley processes. The computed spin relaxation times in silicon are in excellent agreement with experiment in the 50-300 K temperature range. In diamond, we predict intrinsic spin relaxation times of 540 mu s at 77 K and 2.3 mu s at 300 K. We show that the spin-flip and momentum relaxation mechanisms are governed by distinct microscopic processes. Our work enables precise predictions of spin-phonon relaxation times in a wide range of materials, providing microscopic insight into spin relaxation and guiding the development of spin-based quantum technologies.
机构:
CALTECH, Dept Appl Phys & Mat Sci, Pasadena, CA 91125 USACALTECH, Dept Appl Phys & Mat Sci, Pasadena, CA 91125 USA
Chen, Hsiao-Yi
Sangalli, Davide
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CNR, Div Ultrafast Proc Mat FLASHit, ISM, Area Ric Roma 1, I-00016 Monterotondo, Italy
Univ Milan, Dipartimento Fis, Via Celoria 16, I-20133 Milan, ItalyCALTECH, Dept Appl Phys & Mat Sci, Pasadena, CA 91125 USA
Sangalli, Davide
Bernardi, Marco
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CALTECH, Dept Appl Phys & Mat Sci, Pasadena, CA 91125 USACALTECH, Dept Appl Phys & Mat Sci, Pasadena, CA 91125 USA
机构:
Southern Univ Sci & Technol, Dept Phys, Shenzhen 518055, Peoples R ChinaSouthern Univ Sci & Technol, Dept Phys, Shenzhen 518055, Peoples R China
Gu, Mingqiang
Bai, Y. H.
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Indiana State Univ, Off Informat Technol, Terre Haute, IN 47809 USASouthern Univ Sci & Technol, Dept Phys, Shenzhen 518055, Peoples R China
Bai, Y. H.
Zhang, G. P.
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Indiana State Univ, Dept Phys, Terre Haute, IN 47809 USASouthern Univ Sci & Technol, Dept Phys, Shenzhen 518055, Peoples R China
Zhang, G. P.
George, Thomas F.
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Univ Missouri, Dept Chem & Biochem, St Louis, MO 63121 USA
Univ Missouri, Dept Phys & Astron, St Louis, MO 63121 USASouthern Univ Sci & Technol, Dept Phys, Shenzhen 518055, Peoples R China