Deformation Strength of Nanocrystalline Thin Films

被引：5
|
作者：
Blum, W. [1 ]
Eisenlohr, P. [2 ]
机构：
[1] Univ Erlangen Nurnberg, Dept Mat Sci, Inst 1, Martensstr 5, D-91058 Erlangen, Germany
[2] Michigan State Univ, Dept Chem Engn & Mat Sci, E Lansing, MI 48824 USA
来源：
JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY | 2017年 / 33卷 / 07期
关键词：
Stress relaxation; Thin; Film; Nanocrystalline Pd; In situ; Dislocations; RATE SENSITIVITY; RECOVERY; STRAIN;
D O I：
10.1016/j.jmst.2016.11.025
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The data of deformation strength and microstructure of thin films of nanocrystalline Pd recently provided by Colla et al. have been analysed. It is shown that the properties of the films with cylindrical grains of 30nm diameter extending over a significant portion of the film thickness (approximate to 90 nm) are quantitatively comparable to what is known from nanocrystalline bulk material. This is explained in terms of boundarymediated processes governing emission, storage, and recovery of dislocations. (C) 2017 Published by Elsevier Ltd on behalf of The editorial office of Journal of Materials Science & Technology.
引用
收藏
页码：718 / 722
页数：5
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