Impact of film thickness on the external quantum efficiency of bulk photovoltaic effects in Mn-doped BiFeO3 thin films

被引:9
|
作者
Nakashima, Seiji [1 ]
Kato, Ren [1 ]
Fujisawa, Hironori [1 ]
机构
[1] Univ Hyogo, Grad Sch Engn, Dept Elect & Comp Sci, Himeji, Hyogo 6712280, Japan
基金
日本学术振兴会;
关键词
Ferroelectrics; BiFeO3; Bulk photovoltaic effect; LIGHT; SUBSTRATE;
D O I
10.35848/1347-4065/ac0ffb
中图分类号
O59 [应用物理学];
学科分类号
摘要
This work demonstrates an enhancement of the external quantum efficiency (eta (ex)) associated with the bulk photovoltaic effect (BPVE) resulting from the ballistic conduction of hot carriers in indium tin oxide/Mn-doped BiFeO3 (BFMO)/SrRuO3 capacitors in response to a blue-violet laser (lambda = 405 nm). The effect of the BFMO film thickness on the short circuit current showed an abnormal trend in the case of films less than 100 nm thick. This result established that ballistic conduction was the dominant BPVE mechanism, although an effect of the BFMO/electrode interface on the photovoltaic properties may also have been a factor. BFMO films with thicknesses less than 100 nm also exhibited enhanced external quantum efficiency, demonstrating that the ballistic conduction of hot carriers enhanced eta (ex).
引用
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页数:6
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