Permanent circulatory assist device implantation using counterpulsation

被引:0
|
作者
Jeevanandam, V.
Chen, M.
Myren, M.
Anderson, A.
Kantrowitz, A.
Raman, J.
机构
[1] Univ Chicago, Chicago, IL 60637 USA
[2] LVAD Tech, Detroit, MI USA
来源
关键词
D O I
10.1016/j.healun.2006.11.089
中图分类号
R5 [内科学];
学科分类号
1002 ; 100201 ;
摘要
74
引用
收藏
页码:S86 / S86
页数:1
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