Integration Design and Process of 3-D Heterogeneous 6T SRAM with Double Layer Transferred Ge/2Si CFET and IGZO Pass Gates for 42% Reduced Cell Size

被引:25
|
作者
Yu, X. R. [1 ]
Chuang, M. H. [2 ]
Chang, S. W. [1 ,3 ]
Chang, W. H. [4 ]
Hong, T. C. [3 ,5 ]
Chiang, C. H. [2 ]
Lu, W. H. [1 ]
Yang, C. Y. [1 ]
Chen, W. J. [1 ]
Lin, J. H. [6 ]
Wu, P. H. [6 ]
Sun, T. C. [1 ]
Kola, S. [2 ]
Yang, Y. S. [2 ]
Da, Yun [2 ]
Sung, P. J. [3 ]
Wu, C. T. [3 ]
Cho, T. C. [3 ]
Luo, G. L. [3 ]
Kao, K. H. [1 ]
Chiang, M. H. [1 ]
Ma, W. C. Y. [6 ]
Su, C. J. [3 ]
Chao, T. S. [5 ]
Maeda, T. [4 ]
Samukawa, S. [2 ]
Li, Y. [2 ]
Lee, Y. J. [3 ,7 ,8 ]
Wu, W. F. [3 ]
Tarng, J. H. [2 ]
Wang, Y. H. [1 ]
机构
[1] Natl Cheng Kung Univ, Dept Elect Engn, Tainan, Taiwan
[2] Natl Yang Ming Chiao Tung Univ, Coll Elect & Comp Engn, Hsinchu, Taiwan
[3] Taiwan Semicond Res Inst TSRI, Hsinchu, Taiwan
[4] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki, Japan
[5] Natl Yang Ming Chiao Tung Univ, Dept Elect, Hsinchu, Taiwan
[6] Natl Sun Yat Sen Univ, Dept Elect Engn, Kaohsiung, Taiwan
[7] Natl Yang Ming Chiao Tung Univ, Inst Pioneer Semicond Innovat, Hsinchu, Taiwan
[8] Natl Univ Kaohsiung, Dept Elect Engn, Kaohsiung, Taiwan
关键词
D O I
10.1109/IEDM45625.2022.10019507
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, we propose an advanced 3-D heterogeneous 6T SRAM with a newly designed hetero-integration method. CFET inverters and IGZO pass gates are vertically stacked within a 2T footprint area. The Low-Temperature Hetero-Layers Bonding Technique (LT-HBT) process is utilized successfully to fabricate single crystalline heterogeneous Double Layer Transferred (DLT) Ge/2Si CFET-OI on an 8-inch full wafer. Furthermore, an IGZO nFET is deposited and treated as a pass gate (PG) to realize a 6T SRAM operation. The hetero-integration of IGZO PG and self-align DLT Ge/2Si CFET inverters showed improved Read Static Noise Margin (RSNM) and stand-by leakage power. The state-of-the-art 3-D heterogeneous 6T SRAM leads to 42% area reduction.
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页数:4
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