Rapid growth of diamond-like carbon films by nanopulse magnetron chemical vapor deposition

被引：0
|
作者：
Saito, Masanori [1 ]
Saito, Takao
Kondo, Yoshimasa
Murakami, Hiroya
Ohtake, Naoto
机构：
[1] Tokyo Inst Technol, Dept Mech Sci & Engn, Tokyo 1528552, Japan
[2] NGK INSULATORS Ltd, Nagoya, Aichi 4678530, Japan
[3] Nagoya Univ, Dept Mat, Nagoya, Aichi 4648603, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2007年 / 46卷 / 5A期
关键词：
diamond-like carbon (DLC); magnetron; chemical vapor deposition (CVD); Sl thyristor; rapid growth; nanopulse;
D O I：
10.1143/JJAP.46.3029
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
In this paper, we describe the development of a rapid deposition method for diamond-like carbon (DLC) films. The deposition rate of DLC films is investigated using magnetic field enhanced nanopulse plasma chemical vapor deposition (CVD). The maximum deposition rate of DLC films produced by this magnetron CVD is approximately fifty times larger than that of the same films produced by conventional plasma CVD. The area of DLC films having a high deposition rate corresponds to the region of the magnetic field distribution where the field is parallel to the substrate at heights of 15-20mm.
引用
收藏
页码：3029 / 3031
页数：3
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