Growth and characterization of ultrathin epitaxial MnO film on Ag (001)

被引：20
|
作者：
Kundu, Asish K. [1 ]
Menon, Krishnakumar S. R. [1 ]
机构：
[1] Saha Inst Nucl Phys, Surface Phys & Mat Sci Div, 1-AF Bidhannagar, Kolkata 700064, India
来源：
JOURNAL OF CRYSTAL GROWTH | 2016年 / 446卷
关键词：
Surface structure; Characterization; Molecular beam epitaxy; Oxides; ELECTRONIC-STRUCTURE; SPECTROSCOPY; XPS; NIO;
D O I：
10.1016/j.jcrysgro.2016.04.050
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
We present here a comprehensive growth procedure to obtain a well-ordered MnO(001) ultrathin film on Ag(001) substrate. Depending upon the oxygen partial pressure during the growth, different phases of manganese oxide have been detected by Low Energy Electron Diffraction (LEED) and X-ray Photoelectron Spectroscopic (XPS) studies. A modified growth scheme has been adopted to get well-ordered and stoichiometric MnO(001) ultrathin film. The detailed growth mechanism of epitaxial MnO film on Ag (001) has been studied step by step, using LEED and XPS techniques. Observation of sharp (1 x 1) LEED pattern with a low inelastic background, corresponds to a long-range atomic order with low defect densities indicating the high structural quality of the film. The Mn 2p and Mn 3s core-level spectra confirm the oxidation state as well as the stoichiometry of the grown MnO films. Apart from the growth optimization, the evolution of strain relaxation of the MnO(001) film with film thickness has been explored. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码：85 / 91
页数：7
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