Kink effect in short-channel polycrystalline silicon thin-film transistors

被引:53
|
作者
Valletta, A
Gaucci, P
Mariucci, L
Fortunato, G
Brotherton, SD
机构
[1] CNR, IFN, I-00156 Rome, Italy
[2] Philips Res Labs, Redhill RH1 5HA, Surrey, England
关键词
D O I
10.1063/1.1806252
中图分类号
O59 [应用物理学];
学科分类号
摘要
Excess current, induced by impact ionization (kink effect) has been investigated in short-channel polysilicon thin-film transistors (TFTs). We have shown, both experimentally and by using two-dimensional (2-D) numerical simulations, that the output characteristics are substantially degraded by the kink effect as the channel length is reduced. In particular, we have shown that the excess current; triggered by the impact ionization and enhanced by the parasitic bipolar transistor action, scales nearly as L-2, thus making very difficult the downscaling of polysilicon TFTs. Such L dependence has been clarified through a detailed analysis of the current components obtained from 2-D numerical simulations. The analysis demonstrates that there are fundamental issues with the output characteristics, and it appears that the introduction of appropriate drain field relief structures will be necessary for the fabrication of short-channel polysilicon TFTs with high output impedance. (C) 2004 American Institute of Physics.
引用
收藏
页码:3113 / 3115
页数:3
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