Novel fabrication methods for 2D photonic crystals in silicon slab waveguides

In this paper we present the development of several new and novel fabrication methods for the realization of two-dimensional photonic crystal devices in silicon slab waveguides. We begin by presenting a process for the fabrication of high fill-factor devices in silicon-on-insulator wafers. Next, we present a grayscale fabrication process for the realization of three-dimensional silicon structures, such as tapered horn couplers. We then present the fabrication of suspended silicon slabs using a co-polymer process based on direct write electron beam lithography and silicon sputtering. And lastly, we conclude by presenting an alternate method for realizing PhC devices in a silicon slab based on a combination of wet and dry etching processes in bulk silicon wafers.