Pattern formation through selective chemical transformation of self-assembled benzaldimine monolayer by soft X-ray irradiation

被引:4
|
作者
Jung, YJ
Kim, JI
Kang, TH
Ihm, K
Kim, KJ
Kim, B
Park, JW
机构
[1] Pohang Univ Sci & Technol, Div Mol & Life Sci, Dept Chem, Ctr Integrated Mol Syst, Pohang 790784, South Korea
[2] Pohang Univ Sci & Technol, Sch Environm Sci & Engn, Pohang 790784, South Korea
关键词
soft X-ray; benzaldimine monolayer; X-ray photoelectron spectra (XPS); near edge X-ray absorption fine structure (NEXAFS) spectroscopy; pattern; AFM image; fluorescence image;
D O I
10.1016/j.jcis.2004.08.120
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Benzaldimine monolayer was exposed to soft X-rays, and the involved chemical transformation was investigated using X-ray photoelectron spectra and near-edge X-ray absorption fine structure spectroscopy. The spectroscopy indicated that irradiation of soft X-ray (550 eV)-induced selective transformation of the imine group into a nonhydrolyzable one, i.e., the amine group. Utilizing the selective chemical transformation of the imine group with the soft X-ray irradiation, we were able to generate a micropattern. AFM images showed that the patterning with alternating surface topology was effective. The patterned monolayer was further modified with biotin and Cy3-tagged Streptavidin sequentially. Fluorescence images showed that the above molecules were selectively immobilized onto the amine-terminated region of the patterned surface. The current system is found to be more efficient than the predecessor, 4-nitrobenzaldimine monolayer. (C) 2004 Elsevier Inc. All rights reserved.
引用
收藏
页码:241 / 247
页数:7
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