Study of enhanced photovoltaic behavior in InGaN-based solar cells by using SiNx insertion layer: Influence of dislocations

被引:2
|
作者
Lee, Seunga [1 ]
Honda, Yoshio [1 ]
Amano, Hiroshi [1 ]
Jang, Jongjin [2 ]
Nam, Okhyun [2 ]
机构
[1] Nagoya Univ, Grad Sch Engn, Akasaki Res Ctr, Dept Elect Engn & Comp Sci,VBL, Nagoya, Aichi 4648603, Japan
[2] Korea Polytech Univ, Dept Nanoopt Engn, Convergence Ctr Adv Nano Semicond, Shihung 429839, Gyeonggi, South Korea
关键词
LIGHT-EMITTING-DIODES; THREADING DISLOCATIONS; GAN; ULTRAVIOLET; IMPROVEMENT; REDUCTION;
D O I
10.7567/JJAP.55.030306
中图分类号
O59 [应用物理学];
学科分类号
摘要
Using a SiNx insertion layer to reduce dislocations, enhanced photovoltaic properties could be obtained in p-i-n InGaN/GaN heterojunction solar cell. To investigate the influence of the dislocations on the photovoltaic behaviors, a sample grown without SiNx insertion layer was identically prepared for comparison. From optical properties measurements, the reduction in the number of non-radiative centers and a stronger In localization effect was shown in the sample with SiNx insertion layer. However, the quantum confined stark effect was almost negligible in both the samples. Electrical properties measurement showed reduced saturation current and increased shunt resistance in the sample with SiNx insertion layer due to the reduced dislocation density. By comparing these results and using a numerical model, the influence of the dislocation density on the different photovoltaic properties such as open-circuit voltage and fill factor has been confirmed. (C) 2016 The Japan Society of Applied Physics
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页数:4
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