Finally!: Implementation of low-k (<3) intermetal dielectrics

被引：0
|
作者：
Hendiricks, NH [1 ]
机构：
[1] ATMI Inc, Mat Lifecycle Solut, San Jose, CA USA
来源：
SOLID STATE TECHNOLOGY | 2003年 / 46卷 / 03期
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：31 / 32
页数：2
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