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XPS and ToF-SIMS Investigation of Native Oxides and Passive Films Formed on Nickel Alloys Containing Chromium and Molybdenum
被引:54
|作者:
Wang, Zuocheng
[1
]
Carriere, Charly
[1
]
Seyeux, Antoine
[1
]
Zanna, Sandrine
[1
]
Mercier, Dimitri
[1
]
Marcus, Philippe
[1
]
机构:
[1] PSL Res Univ, CNRS, Chim ParisTech, Inst Rech Chim Paris IRCP,Phys Chem Surfaces Grp, F-75005 Paris, France
关键词:
Ni-Cr;
Ni-Cr-Mo;
alloy;
Passivity;
corrosion behavior;
XPS;
ToF-SIMS;
D O I:
10.1149/1945-7111/abf308
中图分类号:
O646 [电化学、电解、磁化学];
学科分类号:
081704 ;
摘要:
X-ray Photoelectron Spectroscopy and Time-of-Flight Secondary Ion Mass Spectrometry were combined to characterize the surface oxides (native oxides and passive films) formed on Ni-based alloys containing chromium and molybdenum. Two alloys were studied, Ni-20Cr and Ni-20Cr-10Mo (in wt.%). For Ni-20Cr, both native oxide and passive films formed in acidic medium present a duplex structure comprising a Ni and Cr outer hydroxide layer and a Cr inner oxide layer. The Ni-20Cr-10Mo alloy presents a similar bilayer structure, but with Mo oxide located at the outer layer/inner layer interface. Cr enrichment is observed after passivation for both alloys. The corrosion resistance in acidic solution containing chlorides is enhanced by Mo, and by electrochemical pre-passivation in Cl free solution.
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页数:9
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