Photoresponsive Stripe Pattern in Achiral Azobenzene Liquid Crystals

被引：1

作者：

Okano, Kunihiko ^{[1
]}

Aya, Satoshi ^{[2
]}

Araoka, Fumito ^{[3
]}

Obara, Haruki ^{[4
]}

Sato, Shiori ^{[1
]}

Yamashita, Takashi ^{[4
]}

Takezoe, Hideo ^{[2
]}

Asakura, Kouichi ^{[1
]}

机构：

[1] Keio Univ, Dept Appl Chem, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan

[2] Tokyo Inst Technol, Dept Organ & Polymer Mat, Meguro Ku, Tokyo 1528552, Japan

[3] RIKEN Ctr Emergent Matter Sci CEMS, Physicohem Soft Matter Res Unit, Wako, Saitama 3510198, Japan

[4] Dept Pure & Appl Chem, Noda, Chiba 2788510, Japan

来源：

CHEMPHYSCHEM | 2015年 / 16卷 / 01期

关键词：

cybotactic cluster; liquid crystals; nematic phase; photochemistry; stripe pattern; GROUND-STATE; POLYMER;

D O I：

10.1002/cphc.201402578

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A periodic stripe pattern is found in the nematic phase close to the smectic phase of photoresponsive achiral liquid-crystalline compounds. The origin of the stripe patterns can be ascribed to an extremely large bent elastic constant K-33. In addition, we succeeded in controlling the pattern by the following two methods: 1) the stripe disappears by a trans-cis photoisomerization upon UV light irradiation and reappears upon light termination, and 2) the stripe pattern is stabilized over the whole nematic phase, at approximately 10 degrees C, by polymerization of the compounds.

引用

页码：95 / 98

页数：4

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