Ultrafast UV laser-induced dynamics in fused silica

被引:1
|
作者
Du, Juan [1 ]
Xue, Bing [2 ,3 ]
Liu, Jun [1 ]
Li, Zehan [4 ]
Kobayashi, Takayoshi [2 ,3 ]
Zhao, Yuanan [4 ]
Leng, Yuxin [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, State Key Lab High Field Laser Phys, Shanghai 201800, Peoples R China
[2] Univ Electrocommun, Adv Ultrafast Laser Res Ctr, Chofu, Tokyo 1828585, Japan
[3] CJST, CREST, Chiyoda Ku, Tokyo 1020076, Japan
[4] Chinese Acad Sci, Shanghai Inst Optic & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
关键词
ultrafast laser spectroscopy; UV laser; self-trapped excitons; induced absorbance change; PULSE INDUCED BREAKDOWN; INDUCED DAMAGE; HOLLOW-FIBER; 400; NM; FEMTOSECOND; COATINGS; SUBPICOSECOND; FILMS; BULK;
D O I
10.1117/12.2068097
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Using 9 fs UV laser pulses, laser induced ultrafast dynamics in fused silica is investigated in the present study. The free carrier dynamics under few-cycle UV laser excitation far below laser damage threshold in the fused silica was studied. After laser excitation, free carrier in the conductive band is found to turn into self-trapped excitons within about 300fs. It is possible that the trapped exciton will result in the incubation effect under the condition of ultrafast high-frequency pulsed UV laser exposure.
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页数:6
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