Low-Power Pulsed Plasma Discharge in a Water Film Reactor

被引：18
|
作者：
Wandell, Robert J. [1 ]
Locke, Bruce R. [1 ]
机构：
[1] Florida State Univ, FAMU FSU Coll Engn, Dept Chem & Biomed Engn, Tallahassee, FL 32310 USA
来源：
IEEE TRANSACTIONS ON PLASMA SCIENCE | 2014年 / 42卷 / 10期
基金：
美国国家科学基金会;
关键词：
Non thermal plasma; organic compound synthesis; plasma chemistry; plasma-liquid interactions; water film;
D O I：
10.1109/TPS.2014.2310055
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
A pulsed plasma discharge was generated from a high pressure mixture of argon and water, which flowed into an enclosed discharge region where two stainless capillary tubes serve as both the inlet and outlet to the discharge region, as well as the anode and cathode which sustain the discharge. The system is used to investigate the potential of functionalizing simple organic compounds by soft oxidation to generate more useful chemical species.
引用
收藏
页码：2634 / 2635
页数：2
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