Design and modeling of bulk and SOI power LDMOSFETs for RF wireless applications

被引:5
|
作者
Trivedi, M
Khandelwal, P
Shenai, K
Leong, SK
机构
[1] Univ Illinois, Dept Elect Engn & Comp Sci, Chicago, IL 60607 USA
[2] Polyfet RF Devices, Camarillo, CA USA
关键词
D O I
10.1016/S0038-1101(00)00084-8
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents the design optimization of LDMOSFET structures for use as power amplifiers in mobile wireless applications. A detailed study has been carried out to evaluate the influence of the device substrate on the RF performance. The performance of devices with bulk and Silicon-on-insulator (SOI) substrates has been compared for 50 V LDMOSFETs. In both cases, p-type and n-type epitaxial layers were considered. Extensive two-dimensional simulations have been performed to understand the device dynamics and to optimize the devices for better RF performance. A simple physics-based circuit model has been developed to enable large signal simulations for RF characterization. It is shown that bulk devices on n-type epitaxial layers yield the highest output RF power for a given voltage and current rating. SOI devices offer comparable RF performance with less area for a given rating, but suffer from self-heating effects. Thick-film SOI is shown as a viable power amplifier technology for integrated RFIC applications. (C) 2000 Published by Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:1343 / 1354
页数:12
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