Kinetics of two-dimensional electrons and holes in tunneling silicon MOS structures

被引:0
|
作者
Altukhov, PD [1 ]
Kuzminov, EG [1 ]
机构
[1] AF Ioffe Phys Tech Inst, St Petersburg 194021, Russia
来源
PHYSICA STATUS SOLIDI B-BASIC RESEARCH | 2000年 / 221卷 / 01期
关键词
D O I
10.1002/1521-3951(200009)221:1<439::AID-PSSB439>3.0.CO;2-A
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
A recombination radiation line (S-line) of surface 2D holes and 2D nonequilibrium electrons is observed in electroluminescence spectra of tunneling [100] silicon MOS (metal-oxide-semiconductor) diodes under tunneling injection of electrons into a self organized electron quantum well. The electron quantum well in presence of an electrical field in the substrate forms an additional potential barrier. The transparency of a double barrier, including the oxide barrier and the additional barrier, can be modulated by the electrical field in the substrate. A possible realization of a tunneling ballistic transistor (tullistor) by use of this modulation is discussed. The tullistor can serve as a fast and effective light emitter or a laser and as a fast photodetector. A simple theory of the tullistor is given. Kinetics of 2D electrons and holes and corresponding kinetics of electroluminescence are analyzed.
引用
收藏
页码:439 / 445
页数:7
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