Multiple ionization in plasma ion source of electromagnetic isotope separator

被引：3
|
作者：
Maczka, D [1 ]
Kiszczak, K [1 ]
Drozdziel, A [1 ]
Pyszniak, K [1 ]
机构：
[1] Marie Curie Sklodowska Univ, Inst Phys, PL-20031 Lublin, Poland
来源：
VACUUM | 2000年 / 58卷 / 2-3期
关键词：
ion sources; atom ionisation; electromagnetic isotope separation; ion implantation;
D O I：
10.1016/S0042-207X(00)00217-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
This paper discusses the ion beam production of multiply charged ions in the electromagnetic isotope separator. The paper is divided into five sections, in which the ion source construction is described and a phenomenological model describing the formation of multiply charged ion beams is proposed. An analysis of the experiment data within the framework of the proposed model has been carried out, and as a result of this the rate constants for the ion production and destruction processes have been determined. (C) 2000 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码：536 / 542
页数：7
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