Unpinning of Fermi level in nanometer-sized Schottky contacts on GaAs and InP

被引:24
|
作者
Hasegawa, H
Sato, T
Kasai, S
机构
[1] Hokkaido Univ, Res Ctr Interface Quantum Elect, Kita Ku, Sapporo, Hokkaido 0608628, Japan
[2] Hokkaido Univ, Grad Sch Elect & Informat Engn, Kita Ku, Sapporo, Hokkaido 0608628, Japan
关键词
Schottky contact; Fermi level pinning; compound semiconductor; electrochemical deposition; nanostructure;
D O I
10.1016/S0169-4332(00)00386-X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Transport properties of two types of electrochemically produced nanometer-sized GaAs and InP Schottky contacts were investigated. One is macroscopic contacts containing many nano-dots and the other is isolated single-dot contacts. Macroscopic contacts showed near ideal thermionic emission characteristics with ideality factors close to unity. I-V characteristics of single nano-dor, contacts directly measured by a conductive AFM probe showed nonlinear log I-V behavior with large and voltage-dependent ideality factors. The latter was explained by potential profile modification due to Fermi level pinning on surrounding free surfaces. Both types of contacts indicated that Fermi level pinning disappears as the dot size is reduced, indicating that strong Fermi level pinning is not intrinsic to Schottky contacts. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:92 / 96
页数:5
相关论文
共 50 条
  • [1] Electrical properties of nanometer-sized Schottky contacts on n-GaAs and n-InP formed by in situ electrochemical process
    Sato, T
    Kasai, S
    Okada, H
    Hasegawa, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2000, 39 (7B): : 4609 - 4615
  • [2] Electrical properties of nanometer-sized Schottky contacts on n-GaAs and n-InP formed by in situ electrochemical process
    Sato, Taketomo
    Kasai, Seiya
    Okada, Hiroshi
    Hasegawa, Hideki
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2000, 39 (7 B): : 4609 - 4615
  • [3] Current transport and capacitance-voltage characteristics of GaAs and InP nanometer-sized Schottky contacts formed by in situ electrochemical process
    Sato, T
    Kasai, S
    Hasegawa, H
    APPLIED SURFACE SCIENCE, 2001, 175 : 181 - 186
  • [4] Fermi level unpinning in ex situ Schottky contacts on n-GaAs capped with low-temperature-grown GaAs
    Lodha, S
    Janes, DB
    Chen, NP
    APPLIED PHYSICS LETTERS, 2002, 80 (23) : 4452 - 4454
  • [5] UNPINNING OF THE FERMI LEVEL ON GAAS BY FLOWING WATER
    IVES, NA
    STUPIAN, GW
    LEUNG, MS
    APPLIED PHYSICS LETTERS, 1987, 50 (05) : 256 - 258
  • [6] Control of Schottky and ohmic interfaces by unpinning Fermi level
    Hara, S
    Teraji, T
    Okushi, H
    Kajimura, K
    APPLIED SURFACE SCIENCE, 1997, 117 : 394 - 399
  • [7] Study of yielding mechanics in nanometer-sized Au contacts
    Stalder, A
    Durig, U
    APPLIED PHYSICS LETTERS, 1996, 68 (05) : 637 - 639
  • [8] Fermi level pinning by metal Schottky contacts on n type GaAs
    Myburg, G
    Meyer, WE
    Auret, FD
    Burger, H
    Barnard, WO
    Goodman, SA
    MATERIALS SCIENCE AND TECHNOLOGY, 1998, 14 (12) : 1269 - 1272
  • [9] Scaling of micro-fabricated nanometer-sized Schottky diodes
    Smit, GDJ
    Flokstra, MG
    Rogge, S
    Klapwijk, TM
    MICROELECTRONIC ENGINEERING, 2002, 64 (1-4) : 429 - 433
  • [10] Structure of nanometer-sized palladium contacts and their mechanical and electrical properties
    Matsuda, Tomoko
    Kizuka, Tokushi
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (7A): : 4370 - 4374