Defect characterization of homo-epitaxially grown 6H-SiC on (0001)silicon and (0001)carbon faces

被引:1
|
作者
Stoemenos, J [1 ]
Di Cioccio, L
Papaioannou, V
David, D
Pudda, C
机构
[1] Aristotelian Univ Salonika, Dept Phys, GR-54006 Salonika, Greece
[2] CEA Technol Avancees, LETI, DMITEC, CENG, F-38054 Grenoble 9, France
关键词
microtwins; 6H to 3C SiC transformation;
D O I
10.4028/www.scientific.net/MSF.264-268.409
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The extended defects like triangular terraces and hexagonal pyramids which are formed on the (0001) Si and (000 (1) over bar) carbon sides, during the homo-epitaxial growth of 6H-SiC, were studied by Atomic Force Microscopy (AFM) and selected cross-section transmission electron microscopy (XTEM), Very often the formation of these extended defects is related with a 6H to 3C transformation. Off-axis (3.5 degrees towards <11 (2) over bar 0>) SiC wafers were used in order to investigate the substrate polarity effect. The defects are strongly related with the bunching of steps. As the length and the height of the microsteps increases the density of these extended defects also increases.
引用
收藏
页码:409 / 412
页数:4
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