Fermi-edge singularity in p-type modulation-doped SiGe quantum wells

被引:3
|
作者
Buyanova, IA
Chen, WM
Henry, A
Ni, WX
Hansson, GV
机构
[1] Department of Physics and Measurement Technology, Linköping University
关键词
D O I
10.1103/PhysRevB.53.R1701
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A strong effect of p-type modulation doping on the radiative recombination in Si/Si1-xGex/Si quantum wells is observed by photoluminescence (PL) spectroscopy. The filling of the Si-Ge quantum wells due to the charge transfer of holes from the B modulation doping in the adjacent Si layers causes an appearance of a broad asymmetric PL band with a characteristic sharp high-energy cutoff. A strong enhancement near the Fermi edge is shown, by varying structure parameters and experimental conditions, to correspond to the Fermi-edge singularity. Experimental evidence on the dominant mechanism responsible for the Fermi-edge singularity is given as due to a nearly resonant scattering between the electronic states near the Fermi energy and the next unoccupied subband of the two-dimensional hole gas.
引用
收藏
页码:R1701 / R1704
页数:4
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