Diffusion-induced grain boundary porosity in NiAl

被引：36
|
作者：
Rabkin, E [1 ]
Klinger, L
Izyumova, T
Semenov, VN
机构：
[1] Technion Israel Inst Technol, Dept Mat Engn, IL-32000 Haifa, Israel
[2] Russian Acad Sci, Inst Solid State Phys, Chernogolovka 142432, Moscow District, Russia
来源：
SCRIPTA MATERIALIA | 2000年 / 42卷 / 11期
关键词：
interface diffusion; vacancy; DIGM; theory and modeling;
D O I：
10.1016/S1359-6462(00)00324-9
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The chemical interdiffusion in Cu-NiAl system was observed to be accompanied by pore formation at the grain boundaries (GB) in the NiAl matrix. The pores have elongated morphology, indicating that the vacancy flux along the GB resulting from the GB Kirkendall effect plays an important role in pore development. This vacancy flux is also leads to GB migration in the diffusion zone. A theory of pore growth caused by GB Kirkendall effect is developed and the time-independent, self-similar pore shapes are calculated. The pore progressively narrows in the middle with increasing amplitude of the non-dimensional flux. A qualitative scenario of GB pores reproduction is discussed.
引用
收藏
页码：1031 / 1037
页数：7
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