Diagnostic of arc discharges for plasma nitriding by optical emission spectroscopy

被引:39
|
作者
Renevier, N
Czerwiec, T
Collignon, P
Michel, H
机构
[1] Balzers SA, ZA, F-68390 Sausheim, France
[2] Ecole Mines, Lab Sci & Genie Surfaces, CNRS, URA 1402, F-54042 Nancy, France
[3] Balzers SA, F-77462 St Thibault Vignes, France
来源
SURFACE & COATINGS TECHNOLOGY | 1998年 / 98卷 / 1-3期
关键词
arc discharge; nitriding; optical emission spectroscopy;
D O I
10.1016/S0257-8972(97)00398-8
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A new high current (100-300 A), low voltage (25-45 V) and low pressure (0.4-1 Pa) are discharge plasma used for steel nitriding is presented and characterized by optical emission spectroscopy (OES), In this process, the nitriding rate is high even if the workpieces are nitrided at floating potential without hydrogen in Ar-N-2 gas mixtures. With H-2, there is no appreciable gain in nitrogen content or in growth rate of the diffusion layer. In this paper, the OES diagnostic technique has been used to characterize the different excitation processes of both neutral and ionic argon species in Ar-N-2, Ar-H-2 and Ar-N-2-H-2 gas mixtures. The reactivity of this process is evaluated by using AISI 316 L austenitic stainless steel substrates nitrided for different treatment times at 690 K. (C) 1998 Elsevier Science S.A.
引用
收藏
页码:1400 / 1405
页数:6
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