Evaluation technology for time-dependent organic contamination on silicon wafer surfaces

被引：0
|
作者：
Habuka, H [1 ]
Ishiwari, S [1 ]
Kato, H [1 ]
机构：
[1] Yokohama Natl Univ, Dept Chem Engn Sci, Yokohama, Kanagawa 2408501, Japan
来源：
SEMICONDUCTOR SILICON 2002, VOLS 1 AND 2 | 2002年 / 2002卷 / 02期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The time-dependent organic contamination on silicon wafer surfaces is evaluated using the new technologies, the model of multicomponent organic species adsorption-induced contamination (MOSAIC) and the silicon plate method. The silicon plate method showed that the concentration of bis(2-ethylhexyl)phthalate (DOP) on the silicon wafer surface reached a steady state which had a relationship with its concentration in the clean room air. This is consistent with the results theoretically predicted using the MOSAIC model. Therefore, this technology is concluded to be effective for evaluating the time-dependent behavior of organic contamination on the silicon wafer surface.
引用
收藏
页码：863 / 874
页数：12
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