A further characteristic of susceptibility to contact allergy: sensitization to a weak contact allergen is associated with polysensitization. Results of the IVDK

被引:18
|
作者
Schnuch, Axel
Brasch, Jochen
Lessmann, Holger
Geier, Johannes
Uter, Wolfgang
机构
[1] Univ Gottingen, Hautklin, Zent IVDK, D-37075 Gottingen, Germany
[2] Univ Schleswig Holstein, Dept Dermatol, Kiel, Germany
[3] Univ Erlangen Nurnberg, Dept IMBE, D-8520 Erlangen, Germany
关键词
contact allergy; delayed-type hypersensitivity; genetics; susceptibility;
D O I
10.1111/j.1600-0536.2007.01116.x
中图分类号
R392 [医学免疫学];
学科分类号
100102 ;
摘要
Although genetic factors probably account for differences in susceptibility to contact allergy, they have not yet been identified, partly due to an insufficient understanding of 'susceptibility'. Regarding polysensitization (PS) as a sign of increased susceptibility, we studied the relationship between PS and sensitization to weak versus strong allergens. Patch test data from 66 835 patients registered by the multicentre project, Information Network of Departments of Dermatology (IVDK) between 1 January 1997 and 31 December 2004, were analysed. The association between the number of sensitization to standard series allergens, and contact allergy to a strong allergen methyldibromoglutaronitrile (MDBGN) and to a weak allergen (paraben mix), was analysed with adjusted logistic regression analysis. In paraben-positive (++/+++) patients, the risk of >= 2, >= 3 or >= 4 additional reactions were significantly increased by a factor of 2.1-4.6 compared to MDBGN-sensitized (++/+++) patients. Varying the basic model, a higher risk of additional positive reactions associated with paraben sensitization was consistently identified. The association between PS and sensitization to weak allergens adds a further characteristic of susceptibility to former findings of the IVDK, where PS was related to an increased risk of induction, elicitation, and cytokine polymorphisms. PS can be regarded as a phenotype to be considered in genetic studies.
引用
收藏
页码:331 / 337
页数:7
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