Deep lithography with protons: A generic technology for the fabrication of refractive micro-optical modules.

被引：12
|
作者：
Volckaerts, B [1 ]
Ottevaere, H [1 ]
Vila, A [1 ]
Muruzabal, M [1 ]
Debaes, C [1 ]
Vynck, P [1 ]
Tuteleers, P [1 ]
Baukens, V [1 ]
Hermanne, A [1 ]
Veretennicoff, I [1 ]
Thienpont, H [1 ]
机构：
[1] Free Univ Brussels, TW,TONA, Dept Appl Phys & Photon, B-1050 Brussels, Belgium
来源：
2000 IEEE/LEOS INTERNATIONAL CONFERENCE ON OPTICAL MEMS | 2000年
关键词：
D O I：
10.1109/OMEMS.2000.879647
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：103 / 104
页数：2
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