Proton Radiation Effects on Y-Doped HfO2-Based Ferroelectric Memory

被引:30
|
作者
Wang, Yan [1 ,2 ]
Huang, Fei [3 ]
Hu, Yuan [1 ,2 ]
Cao, Rongrong [1 ,2 ]
Shi, Tuo [1 ,2 ]
Liu, Qi [1 ,2 ]
Bi, Lei [3 ]
Liu, Ming [1 ,2 ]
机构
[1] Chinese Acad Sci, Inst Microelect, Key Lab Microelect Device & Integrated Technol, Beijing 100029, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
[3] Univ Elect Sci & Technol China, Natl Engn Res Ctr Electromangnet Radiat Control M, Chengdu 610054, Sichuan, Peoples R China
基金
中国国家自然科学基金;
关键词
HfO2; ferroelectric memory; radiation; proton; SPACE; ELECTRONICS; CAPACITORS; FILMS;
D O I
10.1109/LED.2018.2831784
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this letter, ferroelectric memory performance of TiN/Y-doped-HfO2 (HYO)/TiN capacitors is investigated under proton radiation with 3-MeV energy and different fluence (5e13, 1e14, 5e14, and 1e15 ions/cm(2)). X-ray diffraction patterns confirm that the orthorhombic phase Pbc(21) of HYO film has no obvious change after proton radiation. Electrical characterization results demonstrate slight variations of the permittivity and ferroelectric hysteresis loop after proton radiation. The remanent polarization (2P(r)) of the capacitor decreases with increasing proton fluence. But the decreasing trend of 2P(r) is suppressed under high electric fields. Furthermore, the 2P(r) degradation with cycling is abated by proton radiation. These results show that the HYO-based ferroelectric memory is highly resistive to proton radiation, which is potentially useful for space applications.
引用
收藏
页码:823 / 826
页数:4
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