True Surface Topography and Nanomechanical Mapping Measurements on Block Copolymers with Atomic Force Microscopy

被引：46

作者：

Wang, Dong ^{[1
]}

Fujinami, So ^{[1
]}

Nakajima, Ken ^{[1
]}

Nishi, Toshio ^{[1
]}

机构：

[1] Tohoku Univ, WPI Adv Inst Mat Res, Aoba Ku, Sendai, Miyagi 9808577, Japan

来源：

MACROMOLECULES | 2010年 / 43卷 / 07期

关键词：

SEBS; MORPHOLOGY; HEIGHT;

D O I：

10.1021/ma9028695

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

A quantitative method to obtain nanomechanical mapping data of poly(styrene-b-ethylene-co-butylene-b-styrene) (SEBS) triblock copolymers was studied. The samples were scanned at constant force using an E scanner and triangular Si3N4 cantilevers with nominal spring constant of 0.32 N/m. The specific value of periodicity distance determined by fast Fourier two-dimensional-power spectrum was 26.8 ± 2.5 nm. The sample deformation δ was calculated by subtracting the cantilever deflection Δ from the scanner displacement z (δ = z - Δ). The apparent height difference in the tapping mode height image was ~4.5 nm that revealed that the true topography should be the inverse of tapping mode height image.

引用

页码：3169 / 3172

页数：4

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