Properties of ZnS Films Deposited by Radio Frequency Magnetron Sputtering

被引：2
|
作者：
Zhang, Lei [1 ]
Huang, Jian [1 ]
Yang, Huimin [1 ]
Tang, Ke [1 ]
Lin, Meiai [1 ]
Ren, Bing [1 ]
Zhang, Kaixun
Wang, Linjun [1 ]
机构：
[1] Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China
来源：
HIGH-PERFORMANCE CERAMICS VIII | 2014年 / 602-603卷
关键词：
ZnS; radio frequency magnetron sputtering; film; EPITAXY; GROWTH; SAPPHIRE;
D O I：
10.4028/www.scientific.net/KEM.602-603.966
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
In this work, zinc sulfide (ZnS) thin films were prepared by radio frequency (RF) magnetron sputtering on glass substrates. The effects of sputtering power, working pressure, substrate temperature and annealing treatment on the structural and optical properties of ZnS films were studied using X-ray diffraction and UV-visible spectrometer in detailed.
引用
收藏
页码：966 / 969
页数：4
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