The influence of the pressure on the microstructure of yttria-stabilized zirconia thin films deposited by dual magnetron sputtering

被引:6
|
作者
Depla, D. [1 ]
Besnard, A. [2 ]
Lamas, J. [1 ]
机构
[1] Univ Ghent, Dept Solid State Sci, Krijgslaan 281 S1, B-9000 Ghent, Belgium
[2] Arts & Metiers ParisTech LaBoMaP, Rue Porte de Paris, F-71250 Cluny, France
关键词
Yttria-stabilized zirconia; Dual magnetron sputtering; Modelling; Monte Carlo; GROWTH;
D O I
10.1016/j.vacuum.2015.12.013
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Mixed oxide thin films, such as yttria-stabilized zirconia, deposited by dual reactive magnetron sputtering on a non-rotating substrate show a typical microstructure of bended, or tilted columns. Two effects define the tilt. The first effect is the compositional gradient over each column which results in a different lattice spacing. To accommodate this difference, the column bends. As such, the chemical composition has a major influence on the final columnar tilt. The second effect is ballistic shadowing which is controlled by the pressure-distance product. At higher pressure-distances, this second effect plays a more prominent role, and a different behaviour of the columnar tilt as a function of the film composition is noticed. The experimental trends can be understood by the use of a particle trajectory code which provides the angular and energy distribution of the atoms to a ballistic aggregation Monte Carlo code simulating the resulting microstructure. (C) 2015 Elsevier Ltd. All rights reserved.
引用
收藏
页码:118 / 122
页数:5
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