Bipolar resistive switching with improved memory window in W/ZnFe2O4/Pt devices

被引:5
|
作者
Rajarathinam, Senthilkumar [1 ]
Panwar, Neeraj [3 ]
Kumbhare, Pankaj [2 ]
Ganguly, Udayan [2 ]
Venkataramani, Narayanan [1 ]
机构
[1] Indian Inst Technol Bombay IIT Bombay, Dept Met Engn & Mat Sci, Mumbai, Maharashtra, India
[2] Indian Inst Technol Bombay IIT Bombay, Dept Elect Engn, Mumbai, Maharashtra, India
[3] Univ Southampton, Zepler Inst Photon & Nanoelect, Southampton, Hants, England
关键词
ZnFe2O4; Resistive switching; Rapid thermal annealing (RTA); Pulsed laser deposition (PLD); Resistive random-access memory (RRAM); FORMING-FREE; MECHANISMS; ZNFE2O4;
D O I
10.1016/j.mssp.2022.106497
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have demonstrated stable bipolar resistive switching characteristics with low forming voltage in the Rapid Thermal Annealed (RTA) ZnFe2O4 (ZDR6) devices. The structural, surface morphology, surface roughness, and electrical properties of a ZDR6 film was investigated by employing XRD, SEM, AFM and current-voltage (I-V) measurements. The I-V curves show bipolar resistive switching operations. In addition to this, the devices exhibit uniform SET (< 1.6 V) and RESET (<-1.1 V) operation with a memory window (MW) larger than two orders of magnitude and show robust retention (> 104 s) characteristics. From the physical and electrical characterization, it is inferred that the oxygen vacancies pre-existing in ZDR6 films induced by RTA play the primary role in achieving low forming voltage and later stable SET/RESET operations in these devices. The dominant conduction mechanism in these devices for the high resistance state (HRS) consists of ohmic at a lower bias (< 0.6 V) and space charge limited current at higher bias (> 0.6 V), while for the low resistance state (LRS) they follow the ohmic conduction for the entire range of applied bias. This present work reveals a suitable process to fabricate forming-free resistive switching memory devices.
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页数:6
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