Adsorption of O-2 on Si(111)7x7 compared at 300 and 30K

被引：25
|
作者：
Comtet, G [1 ]
Hellner, L [1 ]
Dujardin, G [1 ]
Ramage, MJ [1 ]
机构：
[1] UNIV PARIS 11,PHOTOPHYS MOLEC LAB,CNRS,F-91405 ORSAY,FRANCE
来源：
SURFACE SCIENCE | 1996年 / 352卷
关键词：
chemisorption; oxygen; silicon; visible and ultraviolet photoelectron spectroscopy;
D O I：
10.1016/0039-6028(95)01154-4
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Adsorption of O-2 on Si(111) 7 X 7 at 30 K is studied by UV photoelectron spectroscopy and compared to previous results at 300 K. This demonstrates the existence of two distinct metastable states of O-2 adsorbed on Si(111)7 X 7. Furthermore, it is shown that the initial relative population of these metastable states depends on both the temperature and the O-2 coverage.
引用
收藏
页码：315 / 321
页数：7
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