A Repeatable Epitaxial Lift-Off Process from a Single GaAs Substrate for Low-Cost and High-Efficiency III-V Solar Cells

被引:34
|
作者
Choi, Wonjung [1 ]
Kim, Chang Zoo [2 ]
Kim, Chang Su [3 ]
Heo, Wooseok [4 ]
Joo, Taiha [4 ]
Ryu, Seung Yoon [5 ]
Kim, Hogyoung
Kim, Hongjoon
Kang, Ho Kwan [2 ]
Jo, Sungjin [1 ]
机构
[1] Kyungpook Natl Univ, Sch Architectural Civil Environm & Energy Engn, Taegu 702701, South Korea
[2] Korea Adv Nano Fab Ctr, Nano Proc Div, Gyeonggi Do 443270, South Korea
[3] Korea Inst Mat Sci, Adv Funct Thin Films Dept, Chang Won 641831, South Korea
[4] Pohang Univ Sci & Technol, Dept Chem, Pohang 790784, South Korea
[5] Sunmoon Univ, Dept Informat Display, Chungnam 336708, South Korea
基金
新加坡国家研究基金会;
关键词
ENHANCED DEFECT REACTIONS; GALLIUM-ARSENIDE; SI; DIFFUSION; JUNCTION; GROWTH; ZINC; PHOTOVOLTAICS; LAYERS; REUSE;
D O I
10.1002/aenm.201400589
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The effects of epitaxial materials and solar cell design on the performance of solar cells grown by the multilayer approach are investigated. The novel solar cell structure with a p-on-n type configuration suggested exhibits improved uniformity in the photovoltaic performance because of the suppression of Zn diffusion. This approach provides routes to achieve further improvements and acts as a guideline for the commercialization of the multilayer technique. © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页数:6
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