Effect of different oxide and hybrid precursors on MOF-CVD of ZIF-8 films

被引：14

作者：

Cruz, Alexander John ^{[1
,2
,3
]}

Arnauts, Giel ^{[1
]}

Obst, Martin ^{[1
]}

Kravchenko, Dmitry E. ^{[1
]}

Vereecken, Philippe M. ^{[1
,3
]}

De Feyter, Steven ^{[4
]}

Stassen, Ivo ^{[1
]}

Hauffman, Tom ^{[2
]}

Ameloot, Rob ^{[1
]}

机构：

[1] KU Leuven Univ Leuven, Dept Microbial & Mol Syst, Ctr Membrane Separat Adsorpt Catalysis & Spectros, Celestijnenlaan 200F, B-3001 Leuven, Belgium

[2] Vrije Univ Brussel, Dept Mat & Chem MACH, Res Grp Electrochem & Surface Engn SURF, Pl Laan 2, B-1050 Brussels, Belgium

[3] Imec, Kapeldreef 75, B-3001 Leuven, Belgium

[4] KU Leuven Univ Leuven, Dept Chem, Div Mol Imaging & Photon, Celestijnenlaan 200F, B-3001 Leuven, Belgium

来源：

DALTON TRANSACTIONS | 2021年 / 50卷 / 20期

基金：

欧洲研究理事会;

关键词：

METAL-ORGANIC FRAMEWORKS; MOLECULAR LAYER DEPOSITION; CHEMICAL-VAPOR-DEPOSITION; FREE POWDER SYNTHESIS; ELECTRONIC DEVICES; ZINC-OXIDE; THIN-FILMS; CONVERSION; ROADMAP;

D O I：

10.1039/d1dt00927c

中图分类号：

O61 [无机化学];

学科分类号：

070301 ; 081704 ;

摘要：

Chemical vapor deposition of metal-organic frameworks (MOF-CVD) will facilitate the integration of porous and crystalline coatings in electronic devices. In the two-step MOF-CVD process, a precursor layer is first deposited and subsequently converted to a MOF through exposure to linker vapor. We herein report the impact of different metal oxide and metalcone layers as precursors for zeolitic imidazolate framework ZIF-8 films.

引用

页码：6784 / 6788

页数：5

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