UV-curable Thiol-ene Systems Composed of Dendritic Polyenes to Improve Photosensitivity

被引：0
|
作者：
Aoki, Ken'ichi [1 ,2 ]
Imanishi, Ryota [2 ]
机构：
[1] Tokyo Univ Sci, Grad Sch Sci, Dept Chem, Tokyo 1628601, Japan
[2] Tokyo Univ Sci, Fac Sci, Dept Chem, Tokyo 1628601, Japan
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2017年 / 30卷 / 04期
关键词：
Dendrimer; Thiol-ene photopolymer; UV curing; Norbornene; intermolecular propagation; radical-radical coupling; HYPERBRANCHED ALIPHATIC POLYESTERS; ALTERNATE MULTIADDITION REACTIONS; DENDRIMERS; PHOTOPOLYMERIZATION; BEHAVIOR; RESINS;
D O I：
10.2494/photopolymer.30.421
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
Novel types of the dendritic polyenes with norbornene terminals (DNb(n), n=8,16) were mixed with conventional six-armed polythiol (SH6) and photoinitiator (Ir-369) to obtain dendritic thiol-ene UV-curable materials in large scales. The photosensitivity of the norbornene-based dendritic resins was markedly improved by the activation of two types of polymerizations including thiol-ene polymerizations and radical-radical coupling.
引用
收藏
页码：421 / 424
页数：4
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