Ozone-Based Metal Oxide Atomic Layer Deposition: Impact of N2/O2 Supply Ratio in Ozone Generation

被引：15
|
作者：
Delabie, Annelies [1 ]
Caymax, Matty [1 ]
Gielis, Sven [1 ]
Maes, Jan Willem [2 ]
Nyns, Laura [1 ]
Popovici, Mihaela [1 ]
Swerts, Johan [1 ]
Tielens, Hilde [1 ]
Peeters, Jozef [3 ]
Van Elshocht, Sven [1 ]
机构：
[1] IMEC, B-3001 Louvain, Belgium
[2] ASM Belgium, B-3001 Louvain, Belgium
[3] Univ Louvain, Dept Chem, B-3001 Louvain, Belgium
来源：
ELECTROCHEMICAL AND SOLID STATE LETTERS | 2010年 / 13卷 / 06期
关键词：
THIN-FILMS; DIELECTRIC LAYERS; SILENT DISCHARGE; GROWTH; O-3; IMPROVEMENT; NUCLEATION; PLASMA; SIO2; H2O;
D O I：
10.1149/1.3355207
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
The O-2/N-2 flow ratio during O-3 generation by dielectric barrier discharge has a large impact on the atomic layer deposition (ALD) of metal oxides in a hot wall ALD reactor. For HfO2 ALD using HfCl4 as a metal precursor, a higher growth per cycle and a broader ALD temperature window are obtained when N-2 is added to the O-2 supply of the O-3 generation. A positive impact of N-2 in the O-3 generation is also observed for ZrO2 and La2O3 ALD. A negative impact is observed for Al2O3 ALD: The Al2O3 thickness is reduced for those conditions for O-3 where HfO2 ALD is enhanced. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3355207] All rights reserved.
引用
收藏
页码：II176 / II178
页数：3
相关论文
共 50 条
  • [1] Surface Loss in Ozone-Based Atomic Layer Deposition Processes
    Knoops, Harm C. M.
    Elam, Jeffrey W.
    Libera, Joseph A.
    Kessels, Wilhelmus M. M.
    [J]. CHEMISTRY OF MATERIALS, 2011, 23 (09) : 2381 - 2387
  • [2] Ozone Production and Losses in N2/O2 Mixtures in an Ozone Generator
    Mankelevich, Yu. A.
    Poroykov, A. Yu.
    Rakhimova, T. V.
    Voloshin, D. G.
    Chukalovskii, A. A.
    Zosimov, A. V.
    Lunin, V. V.
    Samoilovich, V. G.
    [J]. RUSSIAN JOURNAL OF PHYSICAL CHEMISTRY A, 2016, 90 (09) : 1896 - 1902
  • [3] Ozone production and losses in N2/O2 mixtures in an ozone generator
    Yu. A. Mankelevich
    A. Yu. Poroykov
    T. V. Rakhimova
    D. G. Voloshin
    A. A. Chukalovskii
    A. V. Zosimov
    V. V. Lunin
    V. G. Samoilovich
    [J]. Russian Journal of Physical Chemistry A, 2016, 90 : 1896 - 1902
  • [4] Nonstationary effects in ozone generation by barrier discharges in N2/O2 mixtures
    A. V. Zosimov
    V. V. Lunin
    V. G. Samoilovich
    E. A. Abramovskaya
    Yu. A. Mankelevich
    A. Yu. Poroykov
    T. V. Rakhimova
    D. G. Voloshin
    [J]. Russian Journal of Physical Chemistry A, 2016, 90 : 1687 - 1692
  • [5] Nonstationary effects in ozone generation by barrier discharges in N2/O2 mixtures
    Zosimov, A. V.
    Lunin, V. V.
    Samoilovich, V. G.
    Abramovskaya, E. A.
    Mankelevich, Yu. A.
    Poroykov, A. Yu.
    Rakhimova, T. V.
    Voloshin, D. G.
    [J]. RUSSIAN JOURNAL OF PHYSICAL CHEMISTRY A, 2016, 90 (08) : 1687 - 1692
  • [6] In Situ Reaction Mechanism Studies on Ozone-Based Atomic Layer Deposition of Al2O3 and HfO2
    Rose, Martin
    Niinistoe, Jaakko
    Endler, Ingolf
    Bartha, Johann W.
    Kuecher, Peter
    Ritala, Mikko
    [J]. ACS APPLIED MATERIALS & INTERFACES, 2010, 2 (02) : 347 - 350
  • [7] Ozone-Based Atomic Layer Deposition of Al2O3 from Dimethylaluminum Chloride and Its Impact on Silicon Surface Passivation
    Bao, Yameng
    Laitinen, Mikko
    Sajavaara, Timo
    Savin, Hele
    [J]. ADVANCED ELECTRONIC MATERIALS, 2017, 3 (06):
  • [8] Experimental Study of Ozone Generation by Negative Corona Discharge in Mixtures of N2 and O2
    Hadji, K.
    Pontiga, F.
    Belasri, A.
    Hadj-Ziane, S.
    Fernandez-Rueda, A.
    [J]. OZONE-SCIENCE & ENGINEERING, 2014, 36 (01) : 65 - 72
  • [9] Ozone-based atomic layer deposition of HfO2 and HfxSi1-xO2 and film characterization
    Senzaki, Y
    Park, S
    Tweet, D
    Conley, JF
    Ono, Y
    [J]. INTEGRATION OF ADVANCED MICRO-AND NANOELECTRONIC DEVICES-CRITICAL ISSUES AND SOLUTIONS, 2004, 811 : 217 - 222
  • [10] Ozone Based Atomic Layer Deposition of Hafnium Oxide and Impact of Nitrogen Oxide Species
    Delabie, Annelies
    Swerts, Johan
    Van Elshocht, Sven
    Jung, Sung-Hoon
    Raisanen, Petri I.
    Givens, Michael E.
    Shero, Eric J.
    Peeters, Jozef
    Machkaoutsan, Vladimir
    Maes, Jan Willem
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2011, 158 (05) : D259 - D263
12345