Suppression of optical damage at 532 nm in Holmium doped congruent lithium niobate

被引：5

作者：

Barnes, Eftihia ^{[1
]}

O'Connell, Nathan H. ^{[1
]}

Balli, Nicolas R. ^{[1
]}

Pokhrel, Madhab ^{[1
]}

Movsesyan, Anush ^{[2
]}

Kokanyan, Edvard ^{[2
,3
]}

Sardar, Dhiraj K. ^{[1
]}

机构：

[1] Univ Texas San Antonio, Dept Phys & Astron, San Antonio, TX 78249 USA

[2] Armenian State Pedag Univ Kh Abovyan, Yerevan, Armenia

[3] Natl Acad Sci Armenia, Inst Phys Res, Ashtarak 2, Armenia

来源：

OPTICS EXPRESS | 2014年 / 22卷 / 21期

基金：

美国国家科学基金会;

关键词：

LATTICE LOCATION; HO3+ IONS; LINBO3; RESISTANCE; CRYSTALS; GROWTH; ER;

D O I：

10.1364/OE.22.026222

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Optical damage experiments were carried out in a series of Holmium doped congruent lithium niobate (Ho:cLN) crystals as a function of dopant concentration and laser intensity. The light induced beam distortion was recorded with a camera and a detector under the pseudo-Z-scan configuration. At 532 nm, strong suppression of the optical damage was observed for the 0.94 mol. % doped crystal. Increased resistance to optical damage was also observed at 488 nm. The suppression of the optical damage is predominantly attributed to the reduction of the Nb antisites due to the holmium doping. (C) 2014 Optical Society of America

引用

页码：26222 / 26231

页数：10

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