Growth of a flat Mn monolayer on Ag(001)

被引:28
|
作者
Schieffer, P [1 ]
Krembel, C [1 ]
Hanf, MC [1 ]
Gewinner, G [1 ]
机构
[1] Fac Sci & Tech, Lab Phys & Spect Elect, F-68093 Mulhouse, France
来源
PHYSICAL REVIEW B | 1998年 / 57卷 / 02期
关键词
D O I
10.1103/PhysRevB.57.1141
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have carefully investigated the possibility of preparing a well-ordered p(1 X 1) two-dimensional Mn monolayer on Ag(001) by means of photoelectron diffraction. It is found that a flat monolayer (ML) with a good degree of perfection is actually achieved by deposition at low rates (typically 0.1-0.2 ML/min) on a substrate held at 80 K. Substrate temperatures higher than similar to 130 K invariably result in the exchange of Mn adatoms with Ag and the formation of a surface alloy. Valence-band photoemission indicates a giant atomiclike magnetic moment in the hat monolayer, essentially the same as in dilute Ag-based Mn alloys. Most interestingly, low-energy electron diffraction reveals a very sharp p(1 X 1) chemical cell pattern with weak but sizable (1/2,1/2) extra spots visible up to about 100 eV and attributed to in-plane c(2 X 2) antiferromagnetic order.
引用
收藏
页码:1141 / 1146
页数:6
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