Predictive modeling of two-component holographic photopolymers

被引:0
|
作者
Kowalski, Benjamin A. [1 ]
Sullivan, Amy C. [2 ,3 ]
Alim, Marvin D.
Mcleod, Robert R. [2 ,3 ]
机构
[1] US Air Force, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
[2] Univ Colorado, Dept Elect Engn, 425 UCB, Boulder, CO 80309 USA
[3] Univ Colorado, Mat Sci & Engn Program, 596 UCB, Boulder, CO 80309 USA
来源
基金
美国国家科学基金会;
关键词
holography; materials modeling; photopolymer; reaction / diffusion equations; DIFFUSION-MODEL; GRATING FORMATION; INHIBITION;
D O I
10.1117/12.2265925
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We present a general strategy for characterizing the reaction and diffusion kinetics of polymeric holographic recording media by which key processes are decoupled and independently measured. The separate processes are combined into a predictive model that is shown to make accurate quantitative predictions of index response over three orders of exposure dose (similar to 1 to similar to 10(3) mJ/cm(2)) and feature size (0.35 to 500 microns) for a model material similar to commercial media. Several critical performance concepts also emerge from the model, including a prediction of a formulation's maximum potential index response, insight into why a particular material may not achieve this maximum and the process that limits the recording resolution.
引用
收藏
页数:9
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