Temperature-dependent Raman linewidths in transition-metal dichalcogenides

被引:8
|
作者
Srivastava, G. P. [1 ]
Thomas, Iorwerth O. [1 ]
机构
[1] Univ Exeter, Sch Phys, Stocker Rd, Exeter EX4 4QL, Devon, England
关键词
THERMAL-CONDUCTIVITY; OPTICAL PHONONS; LAYER MOS2; TRANSISTORS; SCATTERING; STATES; BULK; SILICON;
D O I
10.1103/PhysRevB.98.035430
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Using a semi-ab-initio theoretical method we examine the temperature-dependent linewidth of the Raman modes in bulk and monolayer transition-metal dichalcogenides (TMDs) MoS2, WS2, and MoTe2. It is found that different Raman modes show different linewidths and different temperature dependencies with respect to each other for a given sample and across different TMDs. We explain these characteristics as arising from a combination of phonon density of states, Raman mode frequency, and the relative contributions of temperature-independent mass-defect scattering and temperature-dependent intrinsic anharmonic interactions. Reported measurements for samples prepared under experimental conditions have been explained by adding frequency-dependent inhomogeneity-related background contribution to our theoretical results for the pure and homogeneous samples.
引用
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页数:8
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