Fabrication of submicron gratings in fused silica by F2-laser ablation

被引：62
|
作者：
Ihlemann, J
Müller, S
Pischmann, S
Schäfer, D
Wei, M
Li, J
Herman, PR
机构：
[1] Laser Lab Gottingen, D-37077 Gottingen, Germany
[2] Univ Toronto, Dept Elect & Comp Engn, Toronto, ON M5S 3G4, Canada
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2003年 / 76卷 / 05期
关键词：
D O I：
10.1007/s00339-002-1467-8
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Submicron surface-relief gratings were fabricated on fused silica by F-2-laser ablation with nanosecond duration pulses from a high-resolution 157-nm optical processing system. A 157 nm wavelength projection mask was prepared by ArF-laser ablation to form a 20-mum period grating of equal lines and spaces. A 25-fold demagnification of the mask by a Schwarzschild objective generated gratings of an 830-nm period and a 250 nm modulation depth, as characterized by SEM, AFM and HeNe-laser beam diffraction.
引用
收藏
页码：751 / 753
页数：3
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