Contact-dependent performance variability of monolayer MoS2 field-effect transistors

被引:11
|
作者
Han, Gyuchull
Yoon, Youngki [1 ]
机构
[1] Univ Waterloo, Dept Elect & Comp Engn, Waterloo, ON N2L 3G1, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
D O I
10.1063/1.4902866
中图分类号
O59 [应用物理学];
学科分类号
摘要
Using self-consistent quantum transport simulations, we investigate the performance variability of monolayer molybdenum disulfide (MoS2) field-effect transistors (FETs) with various contact properties. Varying the Schottky barrier in MoS2 FETs affects the output characteristics more significantly than the transfer characteristics. If doped contacts are realized, the performance variation due to non-ideal contacts becomes negligible; otherwise, channel doping can effectively suppress the performance variability in metal-contact devices. Our scaling study also reveals that for sub-10-nm channels, doped-contact devices can be more robust in terms of switching, while metal-contact MoS2 FETs can undergo the smaller penalty in output conductance. (c) 2014 AIP Publishing LLC.
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页数:5
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