High-temperature wear mechanism of diamond at the nanoscale: A reactive molecular dynamics study

被引:9
|
作者
Lin, Qiang [1 ,2 ]
Chen, Sulin [1 ,2 ]
Ji, Zhe [1 ,2 ]
Huang, Zhewei [1 ,2 ]
Zhang, Zhinan [1 ,2 ]
Shen, Bin [1 ,2 ]
机构
[1] Shanghai Jiao Tong Univ, Sch Mech Engn, Shanghai 200240, Peoples R China
[2] Shanghai Jiao Tong Univ, State Key Lab Mech Syst & Vibrat, Shanghai 200240, Peoples R China
基金
中国博士后科学基金; 中国国家自然科学基金;
关键词
Nanoscale wear; Wear of diamond; High temperature; Reactive molecular dynamics; TOOL WEAR; PERFORMANCE; SILICON; FILM; SIMULATION; SURFACE;
D O I
10.1016/j.apsusc.2022.152614
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Diamond is highly wear-resistant at room temperature, while it suffers from rapid wear under the high temperature tribological conditions. In this paper, we present a reactive molecular dynamics study to unveil the nanoscale wear mechanism of diamond with the evolution of temperatures. We find a critical temperature over which the mechanical failure and wear of diamond will be significantly accelerated. The diamond structure fails when the total stress reaches 157-165 GPa, which is composed of thermal stress and friction-induced stress. The thermal stress due to the restriction of thermal expansion substantially increases with temperature and contributes a major part to the total stress. At the critical temperature, the interfacial chemical bonding and the frictional contact are strongly intensified, with substantially increased contact quality and contact area. On the other hand, the temperature elevated to the critical value induces a drastic increase of sp and dangling bonds in diamond, leading to the internal collapse of the mechanical strength. Ultimately, the synergy of the enhanced frictional contact and decreased mechanical strength leads to the failure and wear of diamond. This work provides a novel insight into the wear mechanism of diamond under elevated temperatures, and contributes to the wear theory in diamond materials.
引用
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页数:10
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