Hg1-xCdxTe LWIR photoconductive linear array detector fabrication process control through lifetime monitoring

Process control in fabrication of MCT IR photoconductive (PC) linear array in 8-14 mu m range using non-destructive contactless microwave reflectance technique is discussed. Fabrication of PC linear array involves several processing steps. These steps can damage the material and adversely affect the lifetime of excess carriers and hence need to be monitored to optimise and control the fabrication process. The results of Lifetime monitored at various stages of device fabrication are reported here. Also, the depth of process induced crystalline damage in MCT material. caused by polishing powder has been estimated from these measurements. A correlation has been established between the measured lifetime and performance of detectors and deviation from expected behaviour has been analysed.