Dark current analysis in high-speed germanium p-i-n waveguide photodetectors

被引:66
|
作者
Chen, H. [1 ,2 ]
Verheyen, P. [1 ]
De Heyn, P. [1 ]
Lepage, G. [1 ]
De Coster, J. [1 ]
Balakrishnan, S. [1 ]
Absil, P. [1 ]
Roelkens, G. [2 ]
Van Campenhout, J. [1 ]
机构
[1] IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
[2] Univ Ghent, IMEC, Photon Res Grp, Dept Informat Technol, B-9000 Ghent, Belgium
关键词
JUNCTION LEAKAGE; HIGH-PERFORMANCE; GE; SI; TEMPERATURE; DEPENDENCE; PLATFORM; MODEL;
D O I
10.1063/1.4953147
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present a dark current analysis in waveguide-coupled germanium vertical p-i-n photodetectors. In the analysis, a surface leakage current and a bulk leakage current were separated, and their activation energies were extracted. The surface leakage current originating from the minority carrier generation on the Ge layer sidewalls, governed by the Shockley-Read-Hall process and enhanced by the trap-assisted-tunneling process, was identified as the main contribution to the dark current of vertical p-i-n photodiodes at room temperature. The behavior of this surface leakage current as a function of temperature and reverse bias voltage is well reproduced by using the Hurckx model for trap-assisted-tunneling. Published by AIP Publishing.
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页数:9
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