Development of new X-ray microscopy using a low-energy electron beam

被引：1
|
作者：
Ueda, K [1 ]
机构：
[1] Toyota Technol Inst, Nano High Tech Res Ctr, Tempaku Ku, Nagoya, Aichi 4688511, Japan
来源：
APPLIED SURFACE SCIENCE | 2004年 / 237卷 / 1-4期
关键词：
X-ray microscopy; time-of-flight technique; scanning electron beam; electron excitation;
D O I：
10.1016/j.apsusc.2004.06.060
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Recently, a low-energy electron (ca. 1 keV) excited X-ray microscopy has been developed using the time-of-flight technique in an ultra-high vacuum. Since this X-ray microscope is an application of an electron-stimulated desorption (ESD) microscope, surface hydrogen detection and the Auger electron spectroscopy are also available at the same probing point on the surface. In this report, X-ray microscope and ESD microscope images are demonstrated for a micro-channel plate and Cu-mesh in the electron energy ranging from 900 eV to 1.4 keV with a spatial resolution of ca. 50 nm to 100 nm. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码：636 / 640
页数：5
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