Estimation of the temperature dependent interaction between uncharged point defects in Si

被引:5
|
作者
Kamiyama, Eiji [1 ,2 ]
Vanhellemont, Jan [3 ]
Sueoka, Koji [1 ]
机构
[1] Okayama Prefectural Univ, Dept Commun Engn, Soja, Okayama 7191197, Japan
[2] GlobalWafers Japan Co Ltd, Hadano, Kanagawa 2578566, Japan
[3] Univ Ghent, Dept Solid State Sci, B-9000 Ghent, Belgium
来源
AIP ADVANCES | 2015年 / 5卷 / 01期
基金
日本科学技术振兴机构;
关键词
SILICON; DIFFUSION;
D O I
10.1063/1.4906565
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A method is described to estimate the temperature dependent interaction between two uncharged point defects in Si based on DFT calculations. As an illustration, the formation of the uncharged di-vacancy V-2 is discussed, based on the temperature dependent attractive field between both vacancies. For that purpose, all irreducible configurations of two uncharged vacancies are determined, each with their weight given by the number of equivalent configurations. Using a standard 216-atoms supercell, nineteen irreducible configurations of two vacancies are obtained. The binding energies of all these configurations are calculated. Each vacancy is surrounded by several attractive sites for another vacancy. The obtained temperature dependent of total volume of these attractive sites has a radius that is closely related with the capture radius for the formation of a di-vacancy that is used in continuum theory. The presented methodology can in principle also be applied to estimate the capture radius for pair formation of any type of point defects. (C) 2015 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.
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页数:10
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