Frequency and breakdown properties of AlGaN/GaN HEMTs

被引:0
|
作者
Vertiatchikh, A [1 ]
Schaff, WJ [1 ]
Eastman, LF [1 ]
Matulionis, A [1 ]
机构
[1] Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA
关键词
D O I
10.1109/ISCSPC.2003.1354444
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
AlGaN/GaN heterostructure transistors show potential in high-frequency high-power applications because of their high breakdown voltages and high electron saturation velocities. The operating drain voltage, limiting the maximum RF output power, should be lower than breakdown voltage of the device. The frequency and breakdown properties of the AlGaN/GaN heterostructure transistors have been studied.
引用
收藏
页码:132 / 137
页数:6
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