Structure and properties of ion-plasma deposited Ni-C films in a metastable state

被引：8
|
作者：
Ryabtsev, S. I. [1 ]
Bashev, V. F. [1 ]
Belkin, A. I. [1 ]
Ryabtsev, A. S. [1 ]
机构：
[1] Dnepropetrovsk Natl Univ, UA-49050 Dnepropetrovsk, Ukraine
来源：
PHYSICS OF METALS AND METALLOGRAPHY | 2006年 / 102卷 / 03期
关键词：
Amorphous materials - Electric properties - Nickel alloys - Phase equilibria - Phase transitions - Plasma theory;
D O I：
10.1134/S0031918X06090109
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
A modified ion-plasma sputtering technique was used to produce metastable states, in particular, amorphous (from the standpoint of X-ray diffraction) and nanocrystaline phases in nickel-carbon film alloys in a wide composition range from 7 to 61.4 at. % C. Short-range order parameters of amorphous phases and lattice parameters of metastable phases were determined; the sequential formation and transformation of intermediate phases during the transition of the Ni-C alloys into the equilibrium state are studied. Electrical properties of the deposited alloys in different states were measured; the results obtained are explained.
引用
收藏
页码：305 / 308
页数：4
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